Synthesis of New Ladder Cyclic Materials (Noria Derivatives) with Photo-Reactive Groups and Their Application to EUV-Resists, EB-Resists and Photo-Curable Materials
نویسندگان
چکیده
ABSTRACT Noria derivatives containing protective groups such as t-BOC group, t-butyl ester group (t-BAc), adamantyl group (Ad) were synthesized and evaluated as alkaline developable positive-type EBand EUV-resists. As the result, it was cleared that Noria-t-BOC and Noria-t-BAc showed 50 nm and 70 nm resolutions as EB-resists, respectively. Noria-Ad also showed clear line and space pattern with 22-24 nm resolution as alkaline developable positive-type EUV-resists using SEFT exposure tool (X-slit) on Selete (Tsukuba, Japan). Noria derivatives containing certain polymerizable groups, such as methacryloyl (MA), 2-hydroxy-3-methacryloylpropanoxy (HMPA), vinyl ether (VE), and oxetanyl (OX) groups were synthesized and evaluated as UV-curable materials. As the result, it was found that these photo-cured Noria derivatives have excellent thermal stability.
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